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Full Equipment List
PHOTOLITHOGRAPHY
Equipment for mask making, resist coating, exposing, developing,UV curing and stripping your substrates.
FURNACE PROCESSING
Furnaces for growing silicon oxide and depositing polysilicon, silicon nitride, and silicon oxide as well as processes for cleaning the wafers before deposition.
COMPUTING
Computing resources for computer aided design (CAD), simulation, and analysis.
ELECTRON-BEAM LITHOGRAPHY
Tools for coating, exposing, and developing wafers utilizing advanced electron beam lithography for minimum feature sizes.
ELECTRICAL TESTING
Metrology equipment for electrically testing semiconductor devices.
METROLOGY
Equipment for measuring various aspects of your substrates both during and after your fabrication.
SEMS / MICROSCOPES
Scanning electron microscopes and other imaging tools for examining your nanoscale devices.
ETCHING
Dry etching systems for transferring your nanoscale patterns into your substrates.
THIN FILM DEPOSITION
Tools for depositing insulating, semiconducting, and metallic films on your substrates.
PACKAGING & MISC PROCESSING
Tools for packaging of devices as well as other miscellaneous processing tools.
FACILITIES
Chemical hoods, building systems, and other parts of the laboratory infrastructure.
Full Equipment List Back to Top |
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This material is based upon work supported by the National Science Foundation under Grant No. ECS-0335765. Any opinions, findings, conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect the views of the National Science Foundation. Cornell NanoScale Science & Technology Facility (CNF) 250 Duffield Hall, Cornell University, Ithaca, New York 14853-2700 Voice: 607-255-2329, Fax: 607-255-8601, Email: information@cnf.cornell.edu Powered by ITX |
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