CNF - Lab and Equipment Information

CNF Lab and Equipment Information

Schedule Training ¦

YES Image Reversal Oven

CAC Name: YES NH3

Photoresist image reversal oven

Manager: Garry Bordonaro

Backup: Edward Camacho

Equipment Training
Training is given one-on-one to users on request.

Description:

The YES 58-SM oven uses NH3 (ammonia) gas to reverse the tone of positive photoresist. This can be used to create an undercut profile in the photoresist for lift-off processing. In the reversal process, the chamber is purged of oxygen using vacuum and heat. It is then filled with 600 Torr of NH3 (ammonia) vapor. The NH3 reacts with the acid in the exposed resist rendering it insoluble in developer. The proceeding flood exposure causes acid to form in the previously unexposed areas allowing them to be removed in development, leaving behind the negative image of the first exposure. A descum process using O2 plasma is recommended after lift-off to promote good adhesion of deposited material

Additional Resources:

Equipment Information Sheet
Image Reversal Basics
YES Image Reversal Oven Instructions

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AUTOSTEP AS200 *UNAVAILABLE* June 3rd-7th
May 24, 2013
The AS200 will be undergo regular maintenance beginning June 3rd and continuing the rest of the week. Any changes to the schedule will be posted here.

Please plan accordingly.

Garry

Notice Archive

This material is based upon work supported by the National Science Foundation under Grant No. ECS-0335765. Any opinions, findings, conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect the views of the National Science Foundation.

Cornell NanoScale Science & Technology Facility (CNF)
250 Duffield Hall, Cornell University, Ithaca, New York 14853-2700
Voice: 607-255-2329, Fax: 607-255-8601, Email: information@cnf.cornell.edu