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PHOTOLITHOGRAPHY
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Resist Hot Strip Bath

Heated solvent for photoresist stripping

Resist Strip Hot Bath Backup: Garry Bordonaro , Michael Skvarla
Equipment Training
Training is given one-on-one to users on request.

Description:

The photolithography area has a two tank hot solvent bath for stripping photoresist. A dump rinser and double-stack spin rinse dryer make for easy stripping of wafers or photomasks.

Capabilities:

  • Hot NMP


Additional Resources:

Equipment Information Sheet


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DWL2000 *DOWN*
Dec 12, 2017
The DWL2000 is DOWN again due to focus system issues. HIMT is working on the problem. This notice will be updated as more info is available.

Garry
UPDATED - ASML DUV Stepper *UNAVAILABLE* January 9th - 12th
Dec 01, 2017
The ASML DUV stepper will be unavailable due to a maintenance visit beginning January 9th. Please plan accordingly.

Garry

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