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PHOTOLITHOGRAPHY
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Resist Hot Strip Bath

Heated solvent for photoresist stripping

Resist Strip Hot Bath Backup: Garry Bordonaro , Michael Skvarla
Equipment Training
Training is given one-on-one to users on request.

Description:

The photolithography area has a two tank hot solvent bath for stripping photoresist. A dump rinser and double-stack spin rinse dryer make for easy stripping of wafers or photomasks.

Capabilities:

  • Hot NMP


Additional Resources:

Equipment Information Sheet


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GCA AS200 Stepper *UP*
Oct 19, 2017
The GCA AS200 stepper UP and available for use. The DFAS PC is noticeably slower than before. We are hoping to upgrade the system soon.

Garry

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