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PHOTOLITHOGRAPHY
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Resist Hot Strip Bath

Heated solvent for photoresist stripping

Resist Strip Hot Bath Backup: Garry Bordonaro , Michael Skvarla
Equipment Training
Training is given one-on-one to users on request.

Description:

The photolithography area has a two tank hot solvent bath for stripping photoresist. A dump rinser and double-stack spin rinse dryer make for easy stripping of wafers or photomasks.

Capabilities:

  • Hot NMP


Additional Resources:

Equipment Information Sheet


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Photolithography Training Sessions for the Week of September 18th
Sep 18, 2017
General Photolithography training will be offered Tuesday at 1:30PM. We will meet in the Spinner room.

Heidelberg DWL2000 Mask Writer Training will be offered Wednesday at 3:30PM. Meet at the tool.

AB-M contact aligner, Schott IR inspection tool, MA6 contact aligner, and Wafer Bonder training can be scheduled with Edward Camacho.

________


For any other training sessions, this week contact the tool owner for scheduling. Please review the materials available at each of the web page ...more
ASML DUV Stepper *UNAVAILABLE* Thursday September 21st 9:00 am - Noon
Sep 14, 2017
The ASML DUV Stepper will be UNAVAILABLE Thursday, September 21st, as ASML will be performing diagnostics on the tool.

Garry

EQUIPMENT LIST


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