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L-Edit CAD Software

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L-Edit Layout Editor software by Tanner EDA

Backup: Karlis Musa
Equipment Training
Computer Aided Design Training with L-Edit software is in the CNF CAD Room, 155 Phillips Hall. Please sign up online at least one day in advance on this page or on the CNF Face to Face Training web page. Training will take place only if someone has signed up online.
There are no training sessions currently scheduled.

Description:

L-Edit is a layout editor for photolithography, electron beam lithography, or dot-matrix printing. It runs on Windows computers in the CNF CAD room, the cleanroom, and 2nd floor labs.

L-Edit is used to design devices and produce intermediate files in an industry-standard format.

For the dot-matrix printer the intermediate format is CIF, and the copy of L-Edit in the dot-matrix printer lab must be used to export the file to CIF format.

For electron beam lithography and photolithography the intermediate file format is GDSII.

Contact managers of each e beam or mask making tool to learn how to convert from GDSII to the native file format for that tool. The e beam tools are the JEOL 6300FS and the JEOL 9300FS. The mask makers are the Mann 3600 optical pattern generator and the Heidelberg DWL66 laser pattern generator.

Capabilities:

  • Large, useful manual available from Help menu
  • Boolean and derived layer operations; subtract, grow and shrink on groups of objects
  • Design navigator for easy traversal of design hierarchy
  • Area calculator (in Tools -> Add-Ins)
  • Cross-section viewer to simulate a set of simplified process steps and visualize vertical structure of a device
  • Support for parameterized cells called T-Cells
  • User-programmable interface (UPI) with C/C++ syntax


Additional Resources:

Tanner EDA L-Edit Layout Editor web site


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