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CNF Lab and Equipment Information
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SU-8 Hotplates
CAC Name: SU-8 hotplates 1-4 Hotplates for baking SU-8-coated wafers
Manager: Beth Rhoades
Backup: Edward Camacho
, Garry Bordonaro
Equipment Training
Training for first time use of the room is required.Contact Beth. Please adhere to the instructions on the Equipment Information Sheet. Description:9 hotplates are available for baking SU-8-coated substrates in the SU-8 lithography area (clean room 106). Capabilities:Processes Available:Hotplates have been grouped and labeled to accommodate both users with long and short bake processes Applications:Additional Resources:Equipment Information SheetBack to Top |
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Photolithograhy Training Sessions for the Week of June 17th
Jun 18, 2013 General Photolithography training will be held Tuesday at 1:30 PM. Meet in the Spinner Room. MA6 Mask Aligner training session will be held Wednesday at 10:00AM. Meet in the Contact Aligner Room. ABM Mask Aligner training session will be held Thursday at 10:00AM. Meet in the Contact Aligner Room. PG training will be scheduled based on requests. Please review the materials available at each of the web pages associated with the tools above. PLEASE BE ON TIME! __________ Edwar ...more
SPACE AVAILABLE in Microfluidics Course
Jun 18, 2013 The NBTC is offering a 3-day course covering the design, fab, and assembly of microfluidic devices. The course is offered June 26-28. Contact Teresa Porri if interested. Only a few slots left! 254-5200. ![]()
PHOTOLITHOGRAPHY
5X g-line Stepper ABM Contact Aligner ASML 300C DUV Stepper Autostep i-line Stepper EV620 Contact Aligner Fusion UV Cure Gamma Automatic Coat-Develop Tool Hamatech-Steag Mask Processors Hamatech-Steag Wafer Processors Heidelberg Mask Writer DWL2000 JBA 1000 Photoresist UV Cure Karl Suss RC-8 Manual Resist Spinners Nanoimprint NX-2500 PG Mask Writer Resist Hot Strip Bath SU-8 Hotplates Suss MA6-BA6 Contact Aligner YES Image Reversal Oven YES Polymide Bake Oven YES Vapor Prime Oven Back to Equipment List |
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This material is based upon work supported by the National Science Foundation under Grant No. ECS-0335765. Any opinions, findings, conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect the views of the National Science Foundation. Cornell NanoScale Science & Technology Facility (CNF) 250 Duffield Hall, Cornell University, Ithaca, New York 14853-2700 Voice: 607-255-2329, Fax: 607-255-8601, Email: information@cnf.cornell.edu Powered by ITX |
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