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PHOTOLITHOGRAPHY
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GCA 5x Stepper

CAC Name: 5X

GCA 6300 DSW Projection Mask Aligner, 5X g-line Stepper

GCA-6300 5X g-line Stepper Backup: Michael Skvarla , Edward Camacho
Equipment Training
Stepper training is done with groups of users and consists of two parts: classroom lecture and cleanroom demonstration. The entire session lasts up to 3 hrs. for large groups. This training assumes prior knowledge of or experience in photolithography; viewing the Nanocourse Photolithography video sections is a minimum requirement: http://www.cnfusers.cornell.edu/cnf5_courses.html
There are no training sessions currently scheduled.

Description:

This projection printer uses a g-line (436nm) lens column ( 0.30 N.A.) to provide a 5:1 reduction with a variable field size up to 15mm square. Minimum feature size is <0.9µm. The number and placement of the dies is programmable. Wafer size of 3" up to 150mm can be accommodated, as well as smaller pieces. A customized hand-held chuck system allows rapid change of substrate size. Registered alignment is typically <0.25µm. 5" x 0.090"-thick masks are used. This instrument can be easily converted to function as a GCA 3696 Photorepeater system for exposing photoresist coated glass plates up to 7".


Service schedule for the GCA tools is posted at: http://www.cnf.cornell.edu/cnf_maintenancecalendar.html

Capabilities:

  • Step and repeat exposure system with laser-controlled stage motion
  • Zeiss lens with 0.30 numerical aperture
  • g-line (436 nm) exposure wavelength
  • 15mm field size
  • Resolution to 0.9 µm


Additional Resources:

Equipment Information Sheet
Alignment Mark GDS File
Fiducial Mark GDS File
GCA Stepper Operation Notes
5X Resist Matrix


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ASML DUV Stepper *UNAVAILABLE* December 18th-21st
Nov 17, 2017
The ASML DUV stepper will be unavailable due to a maintenance visit beginning December 18th. Please plan accordingly.

Garry

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