ComputingCleanroom and Equipment StatusCoral - XReporter
Button: Equipment ListButton: MSDS DatabaseButton: Policies & FormsButton: Education & TrainingButton: StaffButton: Events & Seminars Button: Publication Button: About CNF Button: Lab Manual

PHOTOLITHOGRAPHY
     Schedule Training   ¦



GCA 5x Stepper

CAC Name: 5X

GCA 6300 DSW Projection Mask Aligner, 5X g-line Stepper

GCA-6300 5X g-line Stepper Backup: Michael Skvarla , Edward Camacho
Equipment Training
Stepper training is done with groups of users and consists of two parts: classroom lecture and cleanroom demonstration. The entire session lasts up to 3 hrs. for large groups. This training assumes prior knowledge of or experience in photolithography; viewing the Nanocourse Photolithography video sections is a minimum requirement: http://www.cnfusers.cornell.edu/cnf5_courses.html
There are no training sessions currently scheduled.

Description:

This projection printer uses a g-line (436nm) lens column ( 0.30 N.A.) to provide a 5:1 reduction with a variable field size up to 15mm square. Minimum feature size is <0.9µm. The number and placement of the dies is programmable. Wafer size of 3" up to 150mm can be accommodated, as well as smaller pieces. A customized hand-held chuck system allows rapid change of substrate size. Registered alignment is typically <0.25µm. 5" x 0.090"-thick masks are used. This instrument can be easily converted to function as a GCA 3696 Photorepeater system for exposing photoresist coated glass plates up to 7".


Service schedule for the GCA tools is posted at: http://www.cnf.cornell.edu/cnf_maintenancecalendar.html

Capabilities:

  • Step and repeat exposure system with laser-controlled stage motion
  • Zeiss lens with 0.30 numerical aperture
  • g-line (436 nm) exposure wavelength
  • 15mm field size
  • Resolution to 0.9 µm


Additional Resources:

Equipment Information Sheet
Alignment Mark GDS File
Fiducial Mark GDS File
GCA Stepper Operation Notes
5X Resist Matrix


Back to Top

Photolithography Training Sessions for the Week of September 18th
Sep 18, 2017
General Photolithography training will be offered Tuesday at 1:30PM. We will meet in the Spinner room.

Heidelberg DWL2000 Mask Writer Training will be offered Wednesday at 3:30PM. Meet at the tool.

AB-M contact aligner, Schott IR inspection tool, MA6 contact aligner, and Wafer Bonder training can be scheduled with Edward Camacho.

________


For any other training sessions, this week contact the tool owner for scheduling. Please review the materials available at each of the web page ...more
ASML DUV Stepper *UNAVAILABLE* Thursday September 21st 9:00 am - Noon
Sep 14, 2017
The ASML DUV Stepper will be UNAVAILABLE Thursday, September 21st, as ASML will be performing diagnostics on the tool.

Garry

EQUIPMENT LIST


Button: Search Button: Search Keywords
Cornell University
NYSTARNNCINSF