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PHOTOLITHOGRAPHY
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ASML 300C DUV Stepper

CAC Name: ASML

ASML PAS 5500/300C DUV Stepper

ASML PAS 5500/300C Stepper Backup: John Treichler
Equipment Training
Training currently consists of working one-on-one with users on their project. Contact the staff to arrange a project.

Description:

This projection printer uses a DUV (248nm) lens column (0.63 N.A.) to provide a 4:1 reduction with a variable field size up to 21mm square. Minimum feature size is <0.20µm. The number and placement of the dies is programmable. Wafer size of 3" up to 200mm can be accommodated, as well as smaller pieces. Registered alignment is typically <0.045µm. 6" x 0.250"-thick quartz masks are used.

Capabilities:

  • Step and repeat exposure system with laser-controlled stage motion
  • Zeiss lens with 0.63 - 0.40 Variable N.A.
  • DUV (248 nm) exposure wavelength
  • Programmable annular illumination modes
  • 21 x 21 mm field size


Additional Resources:

Equipment Information Sheet

Results:


175nm l/s in UV82

200nm l/s in UV82


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Photolithography Training Sessions for the Week of September 18th
Sep 18, 2017
General Photolithography training will be offered Tuesday at 1:30PM. We will meet in the Spinner room.

Heidelberg DWL2000 Mask Writer Training will be offered Wednesday at 3:30PM. Meet at the tool.

AB-M contact aligner, Schott IR inspection tool, MA6 contact aligner, and Wafer Bonder training can be scheduled with Edward Camacho.

________


For any other training sessions, this week contact the tool owner for scheduling. Please review the materials available at each of the web page ...more
ASML DUV Stepper *UNAVAILABLE* Thursday September 21st 9:00 am - Noon
Sep 14, 2017
The ASML DUV Stepper will be UNAVAILABLE Thursday, September 21st, as ASML will be performing diagnostics on the tool.

Garry

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