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CNF Lab and Equipment Information
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Full Equipment List
PHOTOLITHOGRAPHY
Equipment for mask making, resist coating, exposing, developing,UV curing and stripping your substrates.
FURNACE PROCESSING
Furnaces for growing silicon oxide and depositing polysilicon, silicon nitride, and silicon oxide as well as processes for cleaning the wafers before deposition.
COMPUTING
Computing resources for computer aided design (CAD), simulation, and analysis.
ELECTRON-BEAM LITHOGRAPHY
Tools for coating, exposing, and developing wafers utilizing advanced electron beam lithography for minimum feature sizes.
ELECTRICAL TESTING
Metrology equipment for electrically testing semiconductor devices.
METROLOGY
Equipment for measuring various aspects of your substrates both during and after your fabrication.
SEMS / MICROSCOPES
Scanning electron microscopes and other imaging tools for examining your nanoscale devices.
ETCHING
Dry etching systems for transferring your nanoscale patterns into your substrates.
THIN FILM DEPOSITION
Tools for depositing insulating, semiconducting, and metallic films on your substrates.
PACKAGING & MISC PROCESSING
Tools for packaging of devices as well as other miscellaneous processing tools.
FACILITIES
Chemical hoods, building systems, and other parts of the laboratory infrastructure.
Full Equipment List Back to Top |
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Staff Holiday, Thursday and Friday, 11/26 - 11/27
Nov 20, 2009 Staff will be out and CNF offices will be closed Thursday and Friday, 11/26 & 11/27 for the Thanksgiving holiday. The labs will be open, but buddy rules will be in effect all day on Thursday and Friday due to the staff holiday. Contact Dan Woodie if you have any questions concerning this.
The January 2010 CNF TCN
Oct 19, 2009 Information on the January 2010 CNF Short Course: Technology & Characterization at the Nanoscale (CNF TCN) is now online. The course will run Tuesday-Friday, January 12-15, 2010. The CNF TCN class size is limited to 30 participants so do register early! Information & Registration.... 
COMPUTING ELECTRICAL TESTING ELECTRON-BEAM LITHOGRAPHY ETCHING FACILITIES FURNACE PROCESSING METROLOGY PACKAGING & MISC PROCESSING PHOTOLITHOGRAPHY SEMS / MICROSCOPES THIN FILM DEPOSITION |
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This material is based upon work supported by the National Science Foundation under Grant No. ECS-0335765. Any opinions, findings, conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect the views of the National Science Foundation. Cornell NanoScale Science & Technology Facility (CNF) 250 Duffield Hall, Cornell University, Ithaca, New York 14853-2700 Voice: 607-255-2329, Fax: 607-255-8601, Email: information@cnf.cornell.edu Powered by ITX |
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