Notification
All users of the JEOL electron beam lithography systems are required to take General Electron Beam Lithography Training before their hands-on training with one of the two JEOL systems. General Electron Beam Lithography training usually takes place in the CAD room on Tuesdays from noon to 3 pm. To arrange training, please send email to ebeam@cnf.cornell.edu at least one day in advance. If no-one requests training, training does not take place.
In your email, please include as much of the following information as you can, so we can help with your project as effectively as possible:
1. Principal investigator and purpose of project
2. Substrate and all material layers on the substrate, and their thicknesses
3. Substrate size (small piece or whole wafer)
4. Whether e beam exposure is to be aligned with previous lithography or not. If it is, please read https://www.cnfusers.cornell.edu/ebeam_alignment
5. A GDS pattern file, if you have one.
6. Process that will follow e beam lithography, for example type of etch or metal liftoff
7. Best email and cell phone number (optional) to reach you in case of tool or scheduling problems.
8. Citations to papers similar to your project.
In your email, please include as much of the following information as you can, so we can help with your project as effectively as possible:
1. Principal investigator and purpose of project
2. Substrate and all material layers on the substrate, and their thicknesses
3. Substrate size (small piece or whole wafer)
4. Whether e beam exposure is to be aligned with previous lithography or not. If it is, please read https://www.cnfusers.cornell.edu/ebeam_alignment
5. A GDS pattern file, if you have one.
6. Process that will follow e beam lithography, for example type of etch or metal liftoff
7. Best email and cell phone number (optional) to reach you in case of tool or scheduling problems.
8. Citations to papers similar to your project.
Notice Area