Hot plates for use in baking resist for ebeam lithography
All users of the JEOL electron beam lithography systems are required to take General Electron Beam Lithography Training before hands-on training with one of the two JEOL systems. Topics covered include radiation safety, detailed description of the e beam systems, conversion of GDS files to JEOL format, and writing job files. Please sign up for this training and for training on the 6300 or 9500 when you expect to have substrates to expose within 2 weeks of the training. If there is a long delay between training and exposing, you will have forgotten most of the training and it will be difficult to pick it up again.
General Electron Beam Lithography training usually takes place in the CAD room on Tuesdays from 11:30 am to 2:30 pm to 3 pm. To arrange training, please send email to ebeam (at) cnf.cornell.edu *at least one day in advance*. If no-one requests training, training does not take place.
Tools for coating, exposing, and developing wafers utilizing advanced electron beam lithography for minimum feature sizes.