All users of the JEOL electron beam lithography systems are required to take General Electron Beam Lithography Training before hands-on training with one of the two JEOL systems. Topics covered include radiation safety, detailed description of the e beam systems, conversion of GDS files to JEOL format, and writing job files. Please sign up for this training and for training on the 6300 or 9500 when you expect to have substrates to expose within 2 weeks of the training. If there is a long delay between training and exposing, you will have forgotten most of the training and it will be difficult to pick it up again.

Training signups are via CULearn

Description

Tools for coating, exposing, and developing wafers utilizing advanced electron beam lithography for minimum feature sizes.

JEOL 6300

The unique capability of the JEOL 6300 is that a fifth lens can be used to get a smaller beam spot size and write sub-10 nm features. This is the high resolution writing mode. Writing without the 5th lens in 4th lens mode is called the high speed writing mode.

The tool can accommodate pieces as small as 5mm up to 150mm wafers.

When should I use the JEOL 9500 or the JEOL 6300?

JEOL 9500

The JEOL 9500 is the next generation direct write ebeam lithography system from JEOL. Currently it is the only system in the US and only the 3rd in the world. The CNF tool is the first 9500 with improved column optics for a reduced spot size, making it unique among the systems currently in operation.

Nabity Pattern Generator System

The Nabity system turns an SEM into a simple ebeam system. The hardware takes control of the deflection system on the SEM and can then be used to expose patterns in resist. This is particularly useful when there is a need for low energy exposures. The tool is very manual, as opposed to the fully automated JEOL systems, and the calibrations are very primitive.

Please talk to staff to determine whether the Nabity is the best choice for your project.