Description

Scanning electron microscopes, optical microscopes, and other imaging tools for examining your nanoscale devices.

AFM - Veeco Icon

The operational principle of an atomic force microscope is described by considering a surface of interest being scanned with a sharp tip residing at the free end of a microfabricated cantilever beam. The apex of the tip either gently contacts the surface when imaging is performed in contact mode, or intermittently contacts the surface during tapping mode imaging. The ultrasmall repulsive or attractive forces existing between the tip and the sample cause the cantilever to move up and down in the direction vertical to the surface.

Bruker Energy-dispersive X-ray Spectrometer (EDS)

The Bruker QUANTAX 200 Energy Dispersive X- ray Spectrometer (EDS) with XFlash®6 silicon drift detector is a modular EDS system for qualitative and quantitative microanalysis. The system’s standard-less quantification software enables manual, automatic or interactive spectra evaluation and provides reliable results for specimens with polished or irregular surfaces, thin layers and particles. The XFlash® detector is a Silicon Drift Detector (SDD) which needs no liquid nitrogen cooling, provides high throughput rates and light element detection capabilities.

BX-51 Fluorescence Microscope

The microscope and digital image capture system is located in the CNF wet (biology) lab. The microscope has light pathways for transmitted or reflected brightfield, DIC, darkfield, and fluorescence (filters for TRITC, DAPI and FITC). The stage can accommodate devices, printed materials, microfluidic apparati, and cell cultures. It is available for use with fluorescent devices, particles or cells.

Focused Ion Beam - Hitachi FB-2000A

Focused ion beam (FIB)-based systems provide a versatile tool for performing work at the nanoscale. They can be used to selectively remove material from substrates and to direct write insulator and metal patterns while providing a high resolution inspection system, comparable to that achieved in the scanning electron microscope. These features have made FIB instruments a staple in failure analysis labs and semiconductor foundries alike.

Hitachi S-900

The S-900 is a small sample, high resolution, cold field emission SEM located outside the cleanroom in room 228. It is available for general use but users are encouraged to talk to staff to determine which SEM is best suited to your project.

Nikon Microscope Cameras

The Nikon Digital Sight DS-5M-L1 consists of a 5 Mpixel camera and a controller with a 6.3 inch LCD screen and a mouse. These cameras are connected to the following microscopes:

  • Olympus BX60 on process bench
  • Wild M400 zoom microscope on process bench
  • Olympus MX50 near pattern generators

Olympus Confocal Microscope

The Olympus BX60/U-CFU microscope employs a slit method scanning disk that blocks defocused reflected light from samples and allows only focused light to go through. It generates clear and high resolving images with 0.18-micron compatibility. A mercury lamp house is the standard light source, which provides a bright, clear image. The U-CFU has excellent Z-axis (vertical) detection. A layer in a multi-layer wafer can be observed distinguishably through this capability.

Zeiss Supra SEM

This SEM has resolution of 1.0 nm at 15 kV, and 1.7 nm at 1 kV at high vacuum mode (HV); 2nm at 30kV at variable pressure mode (VP). 100V to 30kV represents the wide range of the accelerating voltage used on the machine with capability of imaging insulating samples at the lower end of the spectrum. Electromagnetic beam and aperature alignment enables rapid changing between the six beam defining apertures. The GEMINI column employs a Schottky field emittor electron source using a single condenser with a crossover-free beam path.

Zeiss Ultra SEM

Scanning electron microscopy is critical for the analysis of nanoscale materials and structures. CNF operates two field emission scanning electron microscopes (SEMs): a Zeiss Supra 55 microscope capable of variable pressure (VP) operation and a Zeiss Ultra 55 microscope optimized for high resolution imaging. Like most modern SEMs, both systems are capable of operating at beam energies from 100 V to 30 kV. However, the unique electron optical design employed in the Zeiss systems enables unsurpassed performance at beam energies from 100 V to 8 kV.