Description

Metrology equipment for electrically testing semiconductor devices.

DC Probe Station and Electronics

A Cascade Summit 12K probe station with 8-inch chuck is available for DC wafer probing. The system includes four high-precision Cascade 208 and 210 DC probe positioners with Kelvin probes, microscope, digital camera, and is coupled with a Temptronic TPO3000 ThermoChuck system with -50 to 200 °C chuck temperature control capability.

Everbeing EB-6 DC Probe Station

An Everbeing EB-6 high precision probe station is available for DC wafer probing. Four low noise, high precision probes are available along with a hot chuck, microscope, and digital camera. The EB-6 was donated to CNF by Everbeing in August 2016. Four high precision Keithley Source Measurement Units (SMU) with connected PC and software are used for voltage and current measurement.

Microwave Large-Signal Probe Station and Electronics

A Cascade Summit 11K probe station with 8-inch chuck is available for RF wafer probing. The system includes two Cascade RF probe positioners, two tuners for fundamental frequency, microscope, and digital camera. The load-pull system is capable of large signal RF measurement up to 20 GHz and -20 dBm maximum output power. Maury ATS software with a dedicated PC is available for controlling.

Microwave Small-Signal Probe Station and Electronics

A Cascade Summit 9600 probe station with 6-inch chuck is available for RF wafer probing. The system includes two Cascade RF probe positioners, microscope, digital camera, and is coupled with a Temptronic TPO3000 ThermoChuck system with -50 to 200 °C chuck temperature control capability. An Agilent E8364B PNA network analyzer is capable of RF measurement in 10 MHz to 50 GHz frequency range with 104 dB of dynamic range, 26 usec/point measurement speed, 32 channels, and 16,001 points, is available.

Zyvex Nanoprobes for Ultra SEM

The Zyvex S-100 Nanoprobes are installed on the Zeiss Ultra-55 SEM and operate under vacuum during imaging or with the beam blanked. The S-100 consists of four individually controlled nanoprobes which can be placed with a precision of five nanometers. The probes have a minimum tip radius of fifty nanometers for precision measurements, but larger probes are available for MEMS or other applications requiring more robust tips.