Equipment for measuring various aspects of your substrates both during and after your fabrication.

Accurion EP3 Imaging Ellipsometer

The ellipsometer uses a nondestructive (noncontact) optical method to determine film thickness and optical properties. It measures thin films and almost any material deposited on a substrate. This might include thin metal films, oxides, organic coatings, or biological molecule layers such as DNA. While ellipsometry was originally a technique for macroanalysis, this device combines original technology with polarization contrast microscopy to give it the capacity to perform microanalysis.

Alpha Step 200

The AlphaStep 200 computerized surface profiler auto-levels and auto-scales step heights up to 160 kA in the kA mode or up to 160 µm in the µm mode, with scan lengths up to 1 cm. The system is good for quick scans of single steps. More complex topographies should be measured on the Tencor P-10.

FilMetrics Film Measurement Systems

The two FilMetrics systems at the CNF can measure optically transparent films.

The F50-EXR system can be used for measurements of thickness, refractive index(n), and dispersion(k), as well as wafer mapping of any of these properties from 30 nm up to 250 micron.

The F40 system is attached to a microscope for film thickness measurement from 20 nm to 20 microns with a measurement spot size ranging from 100 to 10 microns square. The use of the microscope allows you to make measurements on specific features of your pattern devices.

FleXus Film Stress Measurement

A laser scan technique is used to measure wafer surface curvature before, and after wafer processing. Two wavelengths (670 nm and 780 nm) are available to ensure adequate reflected signal from the wafer. The calculated change in curvature is then used to calculate the stress in the film. The wafer is scanned on a hot plate which can be programed for stress vs. temperature measurements.

Malvern Nano ZS Zetasizer

The Zetasizer (Malvern Nano ZS) characterizes nanomaterials in a solution. It uses Dynamic Light Scattering to determine the polydispersity of a sample and measure particle charge, size, and molecular weight. Materials from 0.6 to 6,000 nm can be measured with an electrokinetic potential analysis from -150 to +150 megavolts. A size measurement can be taken with a sample from 12 to 500 microliters. An electrokinetic potential measurement requires a one-milliliter sample.

Malvern NS300 NanoSight

The NanoSight (Malvern NS300) uses the technology of Nanoparticle Tracking Analysis (NTA) to characterize nanoparticles from 30 to 800 nanometers in liquid. Each particle is individually and simultaneously analyzed by direct observation and measurement of diffusion events. A laser beam is passed through the sample chamber, and the particles in suspension scatter light so they can be easily visualized by the 20X magnification microscope and camera. The camera can take 30 frames per second and captures a video file of the particles.

Metricon Model 2010/M Prism Coupler

The Metricon Model 2010/M Prism Coupler utilizes advanced optical waveguiding techniques to rapidly and accurately measure both the thickness and the refractive index/birefringence of dielectric and polymer films as well as refractive index of bulk materials. The 2010/M offers unique advantages over conventional refractometers and instruments based on ellipsometry or spectrophotometry:

P10 Profilometer

A profilometer is a useful metrology tool used to measure surface characteristics in the micron or finer scale. It is an ideal tool for film thickness measurements, wear scar measurements, step height measurements in semiconductor fabrication, etch depth and surface roughness. The unit is a stylus-based surface profiler, with a motorized XY stage with variable speed, capable of 1 Å resolution, 280-300 um vertical dynamic range, 60mm scan length, 1 µm/sec to 25 mm/sec scan speed and 150-600X image magnification.

P7 Profilometer

A profilometer is a precision metrology tool used to measure surface characteristics in the micron to nanometer scale. It is an ideal tool for measuring step heights. This is useful for measuring film thickness, etch depth, surface roughness, wear-scar measurements. Many parameters of surface roughness and waviness can be measured. The P-7 is a stylus-based surface profiler, with motorized XY stage with vacuum hold down, and a wide range of scan parameter settings.

Rame-Hart-contact-angle goniometer

The Rame-Hart 500 contact angle goniomter/tensiometer is capable of measuring contact angle and determining the surface energy of a sample. Contact angle measurements are useful for determining the surface properties of a material. This can include a surface's wettability and its surface free energy. The contact angle can help to determine the cleanliness of a surface and to verify that a particular chemical modification has taken place.

Woollam Spectroscopic Ellipsometer

Ellipsometry is a noninvasive technique that measures the changes in the polarization state (psi and delta) of light reflecting from a substrate. From these parameters, thickness as well as optical properties of thin films are determined. First, in the measurement mode, the polarization change is measured. Then a model based on the layered film stack is applied and respective data is generated. Comparison between the experimental and generated data is then made by utilizing fitting functions.

Zygo Optical Profilometer

The NewView 7300 is a non-contact optical profilometer capable of producing highly accurate, 3D surface topography measurements. The 7300 rapidly measures heights from less than 1 micron up to 20 millimeters, with vertical resolution to 0.1 nm. It is ideally suited for inspecting step heights, MEMS devices, and many other applications. With the stitching option large areas can be measured and combined to form one image. It also has a stroboscopic measurement capability which will takes movies of moving structures like comb drives and oscillators.