Notification
Dear CNF community:
You are cordially invited to the following GenISys workshop. Please register by THIS Friday.
GenISys BEAMER Beginner's Training & Advanced Application Workshop: Understanding Data Preparation
Monday, October 17, 2022
1:30 to 4:30 PM (EDT)
340 Duffield Hall (In-Person Only)
Objective:
The goal of this training course is to allow attendees to become familiar with the BEAMER interface and controls to optimize their e-beam lithography. At the end of the training session, the user should be able to create their own flows, inspect/prepare their data and import/export their layout to the machine format. Users of BEAMER who are familiar with these topics are not required to attend, but many may benefit by adding to their basic skill set.
Topics to be covered:
* Quick Overview Base Module Fundamentals (Import, Export, Bias, Heal, Extract, etc.)
* VIEWER Basics
* Export Module
* Field Control Options
* Multipass
* Fracturing Modes
* Proximity Effect Correction
After the training session, we will use any remaining time for applications questions. This is your opportunity to bring your patterns, process and experimental data for in-person support from GenISys representatives. Please feel free to bring any data you are interested in optimizing for exposure.
Requirements:
It is strongly suggested that you bring a Windows compatible computer and wheeled mouse. User will be provided a temporary BEAMER license for WINDOWS for the day plus demo flows and patterns for various exercises. After the session the user won’t have use of the license but will still have the use of the manual, videos, demo flows and patterns. For the applications session, please bring any relevant pattern and process data, including the chosen material stack.
TO REGISTER
BY THIS FRIDAY, OCTOBER 14th, email Roger McCay <mccay@genisys-gmbh.com>, Marvin Zai <zai@genisys-gmbh.com>, Roberto Ricardo Panepucci <panepucci@cnf.cornell.edu> (ALL THREE!), and include your full name, department & institution, and a description of any BEAMER pattern and process data you'll be bringing and or are particularly interested in discussing.
THE TRAINING IS LIMITED TO THE FIRST 25 REGISTRANTS! Due to the size of the conference room and the one-on-one nature of this training, the workshop is limited to 25 participants. Register ASAP!
You are cordially invited to the following GenISys workshop. Please register by THIS Friday.
GenISys BEAMER Beginner's Training & Advanced Application Workshop: Understanding Data Preparation
Monday, October 17, 2022
1:30 to 4:30 PM (EDT)
340 Duffield Hall (In-Person Only)
Objective:
The goal of this training course is to allow attendees to become familiar with the BEAMER interface and controls to optimize their e-beam lithography. At the end of the training session, the user should be able to create their own flows, inspect/prepare their data and import/export their layout to the machine format. Users of BEAMER who are familiar with these topics are not required to attend, but many may benefit by adding to their basic skill set.
Topics to be covered:
* Quick Overview Base Module Fundamentals (Import, Export, Bias, Heal, Extract, etc.)
* VIEWER Basics
* Export Module
* Field Control Options
* Multipass
* Fracturing Modes
* Proximity Effect Correction
After the training session, we will use any remaining time for applications questions. This is your opportunity to bring your patterns, process and experimental data for in-person support from GenISys representatives. Please feel free to bring any data you are interested in optimizing for exposure.
Requirements:
It is strongly suggested that you bring a Windows compatible computer and wheeled mouse. User will be provided a temporary BEAMER license for WINDOWS for the day plus demo flows and patterns for various exercises. After the session the user won’t have use of the license but will still have the use of the manual, videos, demo flows and patterns. For the applications session, please bring any relevant pattern and process data, including the chosen material stack.
TO REGISTER
BY THIS FRIDAY, OCTOBER 14th, email Roger McCay <mccay@genisys-gmbh.com>, Marvin Zai <zai@genisys-gmbh.com>, Roberto Ricardo Panepucci <panepucci@cnf.cornell.edu> (ALL THREE!), and include your full name, department & institution, and a description of any BEAMER pattern and process data you'll be bringing and or are particularly interested in discussing.
THE TRAINING IS LIMITED TO THE FIRST 25 REGISTRANTS! Due to the size of the conference room and the one-on-one nature of this training, the workshop is limited to 25 participants. Register ASAP!
Notice Area