Area: Photolithography
Area Notice Title Notification
Photolithography Photolithography Training Sessions for the Week of July 22nd General Photolithography training will be offered Tuesday at 1:30 pm. We will meet in the Spinner room.

Heidelberg DWL2000 Mask Writer Training will be offered by request.

AB-M contact aligner, Schott IR inspection tool, MA6 contact aligner, and Wafer Bonder training can be scheduled with Edward Camacho.

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For any other training sessions this week contact the tool owner for scheduling. Please review the materials available at each of the web pages associated with the tools above.

No pre-registration is necessary.

BE ON TIME!

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Edward/Garry/Mike/John
Photolithography ASML DUV Stepper and Gamma will be *UNAVAILABLE* July 30th-31st The ASML DUV Stepper and Gamma will be UNAVAILABLE July 30th-31st as they will be set for 200mm wafers. The tools should be back to 100mm use late on Wednesday. Please plan accordingly.
Photolithography ASML DUV Stepper and Gamma *UNAVAILABLE* July 24th-25th The ASML DUV Stepper and SussTec Gamma will be set for 200mm wafers beginning Wednesday afternoon July 24th and ending Thursday afternoon July 25th. Please plan accordingly. We apologize for any inconvenience.
Area: Electron-Beam Lithography
Area Notice Title Notification
Electron-Beam Lithography General Electron Beam Lithography Training All users of the JEOL electron beam lithography systems are required to take General Electron Beam Lithography Training before their hands-on training with one of the two JEOL systems. General Electron Beam Lithography training usually takes place in the CAD room on Tuesdays from 11:30 am to 2:30 pm. To arrange training, please send email to ebeam@cnf.cornell.edu at least one day in advance. If no-one requests training, training does not take place.
In your email, please include as much of the following information as you can, so we can help with your project as effectively as possible:

1. Principal investigator and purpose of project
2. Substrate and all material layers on the substrate, and their thicknesses
3. Substrate size (small piece or whole wafer)
4. Whether e beam exposure is to be aligned with previous lithography or not
5. Process that will follow e beam lithography, for example type of etch or metal liftoff
6. Best email and cell phone number (optional) to reach you in case of tool or scheduling problems.
7. Citations to papers similar to your project.
Area: Metrology
Area Notice Title Notification
Metrology Woollam Spectroscopic Ellipsometer Training Woollam ellipsometer training usually takes place in the cleanroom on Thursdays from 1 pm to 3 pm. To arrange training, please send email to bleier@cnf.cornell.edu at least one day in advance. If no-one requests training by email, training does not take place.
Before the training please review the Woollam ellipsometry tutorial at https://www.jawoollam.com/resources/ellipsometry-tutorial
Bring a sample you need to characterize, if possible.