Oxford ASP ALD

The Oxford PlasmaPro ASP has been designed to ensure high quality materials that can be deposited at speed with flexibility to run multiple chemistries to give excellent layers for incorporation into devices. This cutting-edge Plasma Enhanced ALD system offers flexibility, conformality, and tunability of ALD with speed for higher throughput and thicker films. Processes under development include Al2O3, AlN, SiO2, Si3N4, HfO2, HfN, TaO5, TaN, TiO2, TiN, ZrO2, and ZrN.