Zeiss Ultra and Supra SEM Training:
First, complete the SEM video training course RSRCH - CNF - SEM101 in CULearn.
Next, let us know you finished the CULearn course and request training, by sending an email to the CNF SEM team, sem@cnf.cornell.edu
Please do not come to the training unless you have a sample ready to image. You will be required to use the SEM within one week of training or your access may be removed.
- Fully Baked Resist Only!
- Samples should be cleaned and baked before imaging
Scanning electron microscopy is critical for the analysis of nanoscale materials and structures. CNF operates two field emission scanning electron microscopes (SEMs): a Zeiss Supra 55 microscope capable of variable pressure (VP) operation and a Zeiss Ultra 55 microscope optimized for high resolution imaging. Like most modern SEMs, both systems are capable of operating at beam energies from 100 V to 30 kV. However, the unique electron optical design employed in the Zeiss systems enables unsurpassed performance at beam energies from 100 V to 8 kV. This is crucial for obtaining high resolution distortion free images of surface.
The Ultra 55 is designed to maximize imaging resolution at low beam energies. It is equipped with a backscatter electron detector engineered to image electrons with energies less than 2 keV. An energy filter incorporated into the detector enables energy selective backscatter (ESB) imaging. This signal can be used to obtain contrast between regions of different composition.
- In Lens Energy Selective Backscatter (ESB) Detector
- Backscatter imaging using 100 eV to 3 keV beam energies
- In situ electrical characterization of samples using the installed Zyvex system
