ICP System with Chlorine and Fluorine processes.
For training, please contact the Tool Manager(s).
- No high vapor pressure materials (Pb, ITO, etc.)
- No gold exposed to the plasma
- Pieces should be mounted to sapphire carrier wafer (4)
Trion Minilock III is an RIE/ICP system who purpose is to etch Chrome.
The system has both chlorinated and fluorinated gases and is capable of handling up to 8-inch wafers and 7" square plates.
- Chrome etching (Cl/O2/Ar)
- Polymer etching (O2/Ar)
- SiO2 etching (CHF3/CF4/Ar)