SubTitle
ICP System with Chlorine and Fluorine processes.
Training
For training, please contact the Tool Manager(s).
Compatibility:
Additional Restrictions
- No high vapor pressure materials (Pb, ITO, etc.)
- No gold exposed to the plasma
- Pieces should be mounted to sapphire carrier wafer (4)
Manager
Backups:
Body
Trion Minilock III is an ICP system and the only one at CNF which allows Category 5 materials.
Capabilities
The system has both chlorinated and fluorinated gases and is capable of handling up to 8-inch wafers and 7" square plates.
Processes Available
- Chrome etching (Cl/O2/Ar)
- Polymer etching (O2/Ar)
- SiO2 etching (CHF3/CF4/Ar)
Many more processes have been developed by users but have not been verified by staff.