To request a training/ target change, click here:
[CNF Sputter Tool] - Training/Target Change Request – Fill out form
If you're having issues accessing the above form, please email the tool owners with your request and information below:
- For training requests
- Piece or full wafer
- What's the substrate material
- What material(s) do you wish to deposit?
- What materials will be on your sample at the time of deposition? Please provide all materials present, even if buried.
- For target change requests
- Which tool(s) would you like the target(s) in?
- When was the last time you used the tool? (weeks/months)
- What target(s) would you like installed?
- When will the target(s) be needed? (Please specify a Monday for installation duration for the week)
- Do you need the target(s) for more than one week? and why?
General training is "hands-on" and will cover DC sputtering. Training takes 1 hour, which includes machine operation with a short film deposition. To avoid having to retrain on the machine, the AJA sputtering tool must be used within 1 week of training.
Advanced training consists of reactive Sputtering with O2 or N2.
- No high vapor pressure substrates or films (Lead, Zinc, Indium, ITO, Tin, Cadmium, etc)
A cryopumped sputter deposition system allows deposition of a variety of metals and dielectrics. A full target list is available below. Both RF and DC sputtering is available on this system. This is a single wafer load-lock tool capable of accommodating up to 6 inch wafers. With rotation during deposition, less than 1% uniformity is encountered over a 4 inch substrate.
- RF and DC sources
- Cryopumped to 2E-8 Torr
- Capacity: Single substrate - load-lock
- Mass flow control for Argon, Nitrogen, and Oxygen
- Substrate rotation
- RF Backsputter and RF in-situ substrate clean
Targets available (3 inch diameter) are: Al, Al+1%Si, Al+1%Si+1%Cu, Cr, Cu, MoSi, SiO2 (RF TARGET), Ti, TiW, W, Ta, Mo, Pt, Ge, Si, Nb
Process data consisting of grain structure, roughness, stress, deposition rates, and step coverage is provided in a printed manual near the AJA tool. Furthermore, Additional Resources (section below) includes a link to a pdf file of the process data.
Follow the target-changing guidelines when requesting targets. To request a target change, click here:
[CNF Sputter Tool] - Training/Target Change Request – Fill out form