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Rudolph FTM

Equipment Menu

  • Photolithography
  • Electron-Beam Lithography
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Training

For training, please contact the Tool Manager(s).

Compatibility:
5 - Class A and B Metals and Compounds
Additional Restrictions
  • You need to know the index of refraction of the film being measured
  • Measurement area is 2 X 6 mm
  • Film optical thickness must be between 300 and 5,000 nm
Manager
Michael Skvarla
Backups:
Alan R. Bleier
Rudolph FTM
Equipment Information Sheet

Please acknowledge the CNF in your presentations, posters, and publications.

This material is based upon work supported by the National Science Foundation under Grant No. NNCI-2025233. Any opinions, findings, conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect the views of the National Science Foundation.

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