SubTitle
Nanoimprint Lithography by Nanonex
Training
For training, please sign up in CULearn for course:
- RSRCH - CNF - Nanoimprint NX-2500 (NetID Link)
- RSRCH - CNF - Nanoimprint NX-2500 (GuesetID Link)
Compatibility:
Additional Restrictions
- None
Manager
Backups:
Body
The NX-2500 is a multi-level nanoimprintor with imprint capabilities in thermoplastic, photo-curable and embossing. It offers excellent uniformity regardless of backside roughness of substrate and template and can correct waving and bowing of surfaces. This machine also eliminates relative lateral shifting between substrate and mold which affects mold lifetime. A very small thermal mass ensure rapid and cooling, resulting in fast process cycles.
Capabilities
- Air Cushion Press, Excellent Uniformity, High Throughput
- Sub 10nm Resolution (Template dependent)
- Sub 1um Overlay Alighment
- Fast Cycle Time (Sub-60sec)
Thermoplastic Imprint module:
- Temperature Range of 0 to 300 Deg C
- Heating Rate >300 Deg C/min
- Cooling Rate >300 Deg C/min
- Pressure Range of 0 to 4 Mpa
Photocuring Module:
- 200 W Narrow Band UV Lamp
- Automatic Control
Mask Loading Capabilities:
- 4,5, and 6 inch Masks
Substrate Handling:
- Maximum 100mm wafers
- Unique Ability to Handle Irregular Shapes and Sizes
Overlay
- < 1 um 3 sigma Overlay Accuracy
- X, Y ,Z Theta Stage
- Split Field Optics and CCD Camera
Processes Available
Process Flow Charts:
Applications
Nanophotonics, Displays, Data Storage, Advance Materials, Biotechnology, Nano-fluidics, etc.
Links:
Resources: