SubTitle
Nanoimprint Lithography by Nanonex
Training

For training, please sign up in CULearn for course:

Additional Restrictions
  • None
Manager
Backups:
Body

The NX-2500 is a multi-level nanoimprintor with imprint capabilities in thermoplastic, photo-curable and embossing. It offers excellent uniformity regardless of backside roughness of substrate and template and can correct waving and bowing of surfaces. This machine also eliminates relative lateral shifting between substrate and mold which affects mold lifetime. A very small thermal mass ensure rapid and cooling, resulting in fast process cycles.

Capabilities
  • Air Cushion Press, Excellent Uniformity, High Throughput
  • Sub 10nm Resolution (Template dependent)
  • Sub 1um Overlay Alighment
  • Fast Cycle Time (Sub-60sec)

Thermoplastic Imprint module:

  • Temperature Range of 0 to 300 Deg C
  • Heating Rate >300 Deg C/min
  • Cooling Rate >300 Deg C/min
  • Pressure Range of 0 to 4 Mpa

Photocuring Module:

  • 200 W Narrow Band UV Lamp
  • Automatic Control

Mask Loading Capabilities:

  • 4,5, and 6 inch Masks

Substrate Handling:

  • Maximum 100mm wafers
  • Unique Ability to Handle Irregular Shapes and Sizes

Overlay

  • < 1 um 3 sigma Overlay Accuracy
  • X, Y ,Z Theta Stage
  • Split Field Optics and CCD Camera
Processes Available
Process_FlowChart

Process Flow Charts:


Start
Template Design
Imprint Type
T-NILS
P-NILS
T-NILS Template Fab: Si
Clean
Oxidation/Deposition
Lithography
Inspection
RIE
Inspection
Resist Strip
Inspect
Oxide Removal
FOTS
Clean Template
Clean Substrate
Dehydrate
Spin
Soft Bake
Stage Prep
Adjust Gasket
Load
Set Parameters
Run
Unload & Separate
P-NILS Template Fab: Quartz
Clean
Sputter
Lithography
Inspection
Metal Etch
Inspection
Resist Strip
Quartz Etch
Inspect
Chrome Etch
FOTS
Template Cleaning
O2 clean
Piranha Clean
Re-Apply FOTS
Contact Angle Measurement
Applications

Nanophotonics, Displays, Data Storage, Advance Materials, Biotechnology, Nano-fluidics, etc.