SubTitle
Photonic Professional GT2:
Training

Please follow the Cornell NanoScale's Training Workflow instructions. 

CULearn training links:

Additional Restrictions

See the CNF User Wiki's Two-photon Lithography page for supplemental background and material details. 

 
 
Body

The NanoScribe GT2 Laser Lithography System is a state of the art two-photon polymerization volumetric maskless printer. It can create three-dimensional nanostructures using a NIR femtosecond laser via direct-write onto a photosensitive resin that is subjected to a non-linear two-photon absorption process. This process involves cross-linking the resin via UV absorption. In essence, the laser sets a focal light cone where a concentration of the light intensity defines the exposure focal spot volume or a “3D Pixel”. Using this technique a CAD design can be broken into and X, Y, Z coordinate system to define the structure pixel by pixel and layer by layer.

The exposure side of the system sits in a fine-tuned vibration isolation table and a high-speed ultra-precise piezoelectric stage for movement in x-y-z, and finally a galvanic mirror defection system for focusing and beam rasterization. Models for printing can be designed using the stand-alone software DeScribe which comes with the tool or with any CAD software capable of outputting DXF or STL file formats. The DeScribe software can import these formats. CNF has 3 Solution sets for particular scales and applications.


 

Capabilities

Technical Specifications:

  • Printing Technology: Layer-by-later Two-Photon Polymerization

  • Minimum XY Feature Size: 160 nm typical; 200 nm specified*

  • Finest vertical resolution: 1,000 nm typical; 1,500 nm specified*

  • Layer distance: 0.3 – 5.0 um*

  • Maximum object height: 8 mm

  • Maximum print volume: 100 mm3

  • Minimum surface roughness Ra: <= 20 nm*

  • Scan speed: <= 100 mm/s*

* Values may vary depending on the objective and photoresin used.

Processes Available

These solution sets are available at the CNF:

  • Small Feature Set: Immersion objective 3D SF 63x, NA=1.4, [IP-L 780 & IP-Dip]

  • Medium Feature Set: Immersion objective 3D MF 25x, NA= 0.8, [IP-S]

  • Large Feature Set: Immersion objective 3D LF 10x, NA=0.3, [IP-Q]
Applications
  • Microfluidics
  • Micromechanics
  • Biomedical Engineering
  • Micro-electro-mechanical systems
  • Mechanical metamaterials
  • Micro-optics
  • Photonic metamaterials and Plasmonics