AJA Orion 5 sputter deposition system for depositing a wide variety of materials.
Tool Location
110

To request a training/ target change, click here:

[CNF Sputter Tool] - Training/Target Change Request – Fill out form

If you're having issues accessing the above form, please email the tool owners with your request and information below:

  • For training requests
  1. Piece or full wafer
  2. What's the substrate material
  3. What material(s) do you wish to deposit?
  4. What materials will be on your sample at the time of deposition? Please provide all materials present, even if buried.
  • For target change requests
  1. Which tool(s) would you like the target(s) in?
  2. When was the last time you used the tool? (weeks/months)
  3. What target(s) would you like installed?
  4. When will the target(s) be needed? (Please specify a Monday for installation duration for the week)
  5. Do you need the target(s) for more than one week? and why?
Compatibility:
5 - Class A and B Metals and Compounds
Additional Restrictions
  • Tool users should discuss their specific materials needs with staff
  • Due to laboratory material restriction policies, once a sample uses this chamber it may be restricted from other vacuum systems within the facility including etching and deposition systems.
Manager
Chris Martin
Backups:
Shilling Du
Philip Schneider
Image of the AJA 3 Orion 5 sputter deposition system in the CNF cleanroom.

The AJA 3 system at CNF has two DC power supplies allowing for co-sputtering of materials. The tool also has an RF supply for substrate cleaning and preparation. Currently available targets include: Ag, Au, Ti, Al, Cu, Pd and others.

Process gasses include: Argon

Equipment Information Sheet