AJA Orion 5 sputter deposition system for depositing a wide variety of materials.
Tool Location
110

To request a training/ target change, click here:

[CNF Sputter Tool] - Training/Target Change Request – Fill out form

Compatibility:
4 - Glass and Metal Categories
Additional Restrictions
  • Tool users should discuss their specific materials needs with staff
  • Due to laboratory material restriction policies, once a sample uses this chamber it may be restricted from other vacuum systems within the facility including etching and deposition systems.
Manager
Tom Pennell
Backups:
Shilling Du
Philip Schneider
Image of the AJA 3 Orion 5 sputter deposition system in the CNF cleanroom.

The AJA 3 system at CNF has two DC power supplies allowing for co-sputtering of materials. The tool also has an RF supply for substrate cleaning and preparation. Currently available targets include: Ag, Au, Ti, Al, Cu, Pd and others.

Process gasses include: Argon

Equipment Information Sheet