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Veeco Savannah ALD

Equipment Menu

  • Photolithography
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Training

For training, please contact the Tool Manager(s).

Compatibility:
4 - Glass and Metal Categories
Additional Restrictions
  • No films thicker than 50nm or 500 loops without permission of the tool manager
  • All sizes from pieces to 200mm wafers allowed
Manager
Jeremy Clark
Backups:
Philip Schneider
The CNF Veeco Savannah ALD tool in the cleanroom
Processes Available

Thermal ALD

  • Al2O3
  • Pt (Oxygen or low temperature Ozone)
  • Ru
  • Pd (under development)
Equipment Information Sheet

Please acknowledge the CNF in your presentations, posters, and publications.

This material is based upon work supported by the National Science Foundation under Grant No. NNCI-2025233. Any opinions, findings, conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect the views of the National Science Foundation.

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