Hot plates for baking electron beam lithography resist

TRAINING

Please go through the general photolithography training before using these hot plates.

Compatibility:
5 - Class A and B Metals and Compounds
Additional Restrictions
  • None
Manager
Alan R. Bleier

Hot plates for use in baking resist for ebeam lithography

Capabilities
  • 1 hot plate at 170°C
  • 1 general use vacuum oven up to 120°C
  • 4 general use hot plates for ebeam lithography up to 225°C
Equipment Information Sheet