Imaging Ellipsometer for Optical Characterization of Thin Films

For training, please contact the Tool Manager(s).

Additional Restrictions

The ellipsometer uses a nondestructive (noncontact) optical method to determine film thickness and optical properties. It measures thin films and almost any material deposited on a substrate. This might include thin metal films, oxides, organic coatings, or biological molecule layers such as DNA. While ellipsometry was originally a technique for macroanalysis, this device combines original technology with polarization contrast microscopy to give it the capacity to perform microanalysis.

  • Resolution: 1-2 micron in x/y, ~1 Angstrom in z
  • Ellipsometric precision: Delta/Psi precision 0.002 deg Absolute accuracy 0.1 deg
  • Thermal stage with ramping capability (0.5-60 C/min) and a range of ~20-110 C
  • Two light source options: Internal solid state 532nm laser, or Xenon Arc lamp with filter wheel.
  • Forty eight wavelengths between 380 – 900 nm available.
Processes Available
  • Liquid cell enables measurement of hydrated samples.
  • Surface plasmon resonance fluid cell for imaging surface plasmon resonance and fluid measurements in an inverted setup.
  • Kinetics add-on software allows measurements in real time.