- To arrange training, please send email to the tool manager.
- Before the training please review the Woollam ellipsometry tutorial
- Bring a sample you need to characterize, if possible.
- 10 mm pieces to 150 mm wafers
Ellipsometry is a noninvasive technique that measures the changes in the polarization state (psi and delta) of light reflecting from a substrate. From these parameters, thickness as well as optical properties of thin films are determined. First, in the measurement mode, the polarization change is measured. Then a model based on the layered film stack is applied and respective data is generated. Comparison between the experimental and generated data is then made by utilizing fitting functions. Mean squared error (MSE) is employed to quantify the difference between the experimental and model generated data. Minimization of MSE is accomplished through the model and fit phase of the process.
The variable angle spectroscopic ellipsometer in the CNF has the spectral range from 193nm – 1700nm. The automated translation stage has 150mm by 150mm XY mapping capability, with automated angle range from 20-90 degrees. A copy of the WVASE32 manual and software is available in the CNF CAD room for data analysis. Please consult the manual for more advanced features. Please contact the staff for details.
- 193nm – 1700nm spectral range
- 150x150 mm XY mapping capability
- 20-90 degree angle range