AJA Quantum Materials Sputter Deposition System

Users must be trained and demonstrate proficiency on standard AJA sputter systems prior to gaining access to this tool.

Compatibility:
1E - Silicon Based Materials and Select Dieletrics
Additional Restrictions

This tool is restricted to quantum computing research with associated materials. New materials will be evaluated on a case by case basis.

  • No photoresist
  • No high vapor pressure substrates or films
  • Primary materials are Aluminum, Niobium, Tantalum and Titanium
Manager
Tom Pennell
Backups:
Shilling Du

The AJA Quantum Materials Sputter Deposition System is a loadlocked UHV sputter deposition system equipped with a variety of functionalities to enable the creation of next generation quantum devices. The tool has both RF and DC sputtering capability, RF substrate pre-treatment and in chamber ion source for substrate cleaning. The chamber has two sputter guns for deposition of various materials as well as two manually adjustable off axis sputter guns for low energy sputter deposition.

Equipment Information Sheet