1E - Silicon Based Materials and Select Dieletrics

This tool is restricted to quantum computing research with associated materials. New materials will be evaluated on a case by case basis.

• No photoresist
• No high vapor pressure substrates or films
• Primary materials are Aluminum, Niobium, Tantalum and Titanium

• MOS CLEAN required prior to use

• Silicon nitride etching only - no metal etching
• Teflon boats only!

• Si substrates only
• SiN masks only

• MOS CLEAN required prior to use
• Only use designated MOS holders, wands and tweezeers

• MOS CLEAN required prior to use
• Only use MOS designated holders, wands and tweezers

• MOS CLEAN required prior to use
• Only use MOS designated holders, wands and tweezers

• MOS CLEAN required prior to use
• Only use MOS designated holders, wands and tweezers

• MOS CLEAN required prior to use
• Only use MOS designated holders, wands and tweezers

• MOS CLEAN required prior to use
• Only use MOS designated holders, wands and tweezers

• MOS CLEAN required prior to use
• Only use MOS designated holders, wands and tweezers

• MOS CLEAN required prior to use
• Only use MOS designated holders, wands and tweezers