For training, please contact the Tool Manager(s).
Training is by small group classes scheduled as required and takes about 30 minutes.
- Silicon nitride etching only - no metal etching
- Teflon boats only!
Hot Phosphoric Acid - Boiling phosphoric acid is used for etching silicon nitride selectively to silicon oxide. The tank is specifically designed for nitride etching with a controller that can maintain the phosphoric acid boiling point to within 0.5°C. This setup is for electronic grade substrates only.
- Hot phosphoric acid