Staff Information

Phil Infante

Title

PECVD, MOS, Safety

Email - Directory

infante@cnf.cornell.edu

Office Phone

Manager for:

Boron Doping - D1

Carbon Nanotube/Graphene Furnace

Category 3 LPCVD LTO410 - A3

Category 3 MOS Clean Bench & Tanks

Category 3 Polysilicon - A4

CMOS Gate Oxide - E1

CMOS N+ Polysilicon - D3

CMOS P+ Polysilicon - D4

CMOS Undoped Poly - E3

CMOS Wet Oxide - E2

Everbeing 4-Point Probe

Everbeing EB-6 DC Probe Station

General Material Anneal 1 - A1

Hot Phosphoric Tank

Keithley 4200A - IVCV Testing Station

LPCVD CMOS Nitride - E4

LPCVD Nitride - B4

LPCVD TEOS - C3

MOS Clean Anneal 2 - B1

MOS Clean Bench & Tanks

MOS Metal Anneal 3 - C1

MOS Metal Anneal 4 - C2

N+/P+ Polysilicon - C4

Phosphorus Doping - D2

POCL3 Doping - A2

Soft Materials 4-pt Probe Station (2nd floor)

Wet/Dry Oxide - B2

Backup for:

Primaxx Vapor HF Etcher

PVD 75 Sputter Deposition

Spin Rinse Dryers