Staff Information

Phil Infante

Title

PECVD, MOS, Safety

Email - Directory

infante@cnf.cornell.edu

Office Phone

Manager for:

A1 - General Material Anneal 1

A2 - POCL3 Doping

A3 - Category 3 LPCVD Silicon Nitride

A4 - LPCVD Silicon Carbide

B1 - Category 1 MOS Clean Anneal 2

B2 - Wet/Dry Oxide

B4 - LPCVD Silicon Nitride

C1- MOS Metal Anneal 3

C2 - MOS Metal Anneal 4

C4 - N+/P+ Polysilicon

D1 - Solid Source Boron Doping

D2 - Solid Source Phosphorus Doping

D3 - CMOS N+ Polysilicon

D4 - CMOS P+ Polysilicon

E1 - CMOS Gate Oxide

E2 - CMOS Wet Oxide

E3 - CMOS Undoped Poly

E4 - LPCVD CMOS Nitride

Everbeing 4-Point Probe

Everbeing EB-6 DC Probe Station

Filmetrics RS50

Hot Phosphoric Tank

Keithley 4200A - IVCV Testing Station

MOS Clean Bench & Tanks

MOS Clean Bench & Tanks - Category 3 Materials

Seki Diamond CVD

Soft Materials 4-pt Probe Station (2nd floor)

Backup for:

Primaxx Vapor HF Etcher

PVD 75 Sputter Deposition

Spin Rinse Dryers