For training, please contact the Tool Manager(s).
Training is about 1.5 hours and is done as needed. A short etch will be included in the training.
Send email to discuss process applicability and set up a convenient training time.
- Samples up to 6 diameter.
- Check with machine manager before etching samples with non-standard materials.
- No Cadmium or Zinc films and substrate materials!
The AJA Ion Mill is a 22cm diameter Kaufman RF-ICP gridded ion source producing a collimated Argon ion beam which provides uniform etching of samples up to 6 inch diameter. The sample holder is water cooled at 20 degrees C. and has motorized tilt (0-180 degrees), and continuous sample rotation up to 25 RPM. The system is Cryo Pumped with a base pressure in the 10-8 torr range.
Etching a wide range of Materials at rates which are related to their sputter yield. The wafer tilt and rotation feature is typically used to control the etch wall angle.
The system is set with 4 different beam energies: 400V, 600V, 800V, and 1000V.
Ion milling is often very useful for etching of materials which are difficult to RIE. Magnetic,Super conducting, Metal Oxides, Metal Nitrides, Piezoelectric, Noble Metals ( Au, Pd etc).