Staff Information

Aaron Windsor

Title

Thin Film Process Engineer

Email - Directory

windsor@cnf.cornell.edu

Office Phone

Manager for:

Anatech Resist Strip

Angstrom E-Beam Evaporator

CHA Mark 50 E-beam Evaporator

FleXus Film Stress Measurement

General Chemistry Hoods

Glen 1000 Resist Strip

Oxford 81 Etcher

Oxford 82 Etcher

PVD 75 Sputter Deposition

SC4500 Even-Hour Evaporator

SC4500 Odd-Hour Evaporator

YES EcoClean Asher

Backup for:

Boron Doping - D1

Carbon Nanotube/Graphene Furnace

Category 3 LPCVD LTO410 - A3

Category 3 MOS Clean Bench & Tanks

Category 3 Polysilicon - A4

CMOS Gate Oxide - E1

CMOS N+ Polysilicon - D3

CMOS P+ Polysilicon - D4

CMOS Undoped Poly - E3

CMOS Wet Oxide - E2

Dishwasher-left

Dishwasher-right

Electroplating Hood - Au

Electroplating Hood - Cu

Electroplating Hood - Ni

Everbeing EB-6 DC Probe Station

General Material Anneal 1 - A1

Harrick Plasma Generator (2nd Floor)

KOH Hood and Bath

LPCVD CMOS Nitride - E4

LPCVD Nitride - B4

LPCVD TEOS - C3

MOS Clean Anneal 2 - B1

MOS Clean Bench & Tanks

MOS Metal Anneal 3 - C1

MOS Metal Anneal 4 - C2

N+/P+ Polysilicon - C4

Phosphorus Doping - D2

Plasma-Therm Takachi ALE

POCL3 Doping - A2

ReynoldsTech Polymer Vapor Deposition

Wet/Dry Oxide - B2