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  • Photolithography
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Aaron Windsor
Title
Thin Film Process Engineer
Email - Directory
windsor@cnf.cornell.edu
Office Phone
607-254-4831
Manager for:
AJA Ion Mill
Anatech Resist Strip
Angstrom E-Beam Evaporator
CHA Evaporator
CHA Mark 50 E-beam Evaporator
General Chemistry Hoods
Glen 1000 Resist Strip
PT720 Etcher
PT740 Etcher
PVD 75 Sputter Deposition
SC4500 Even-Hour Evaporator
SC4500 Odd-Hour Evaporator
YES Asher
Backup for:
Boron Doping - D1
Carbon Nanotube/Graphene Furnace
Category 3 LPCVD LTO410 - A3
Category 3 MOS Clean Bench & Tanks
Category 3 Polysilicon - A4
CMOS Gate Oxide - E1
CMOS N+ Polysilicon - D3
CMOS P+ Polysilicon - D4
CMOS Undoped Poly - E3
CMOS Wet Oxide - E2
Dishwasher-left
Dishwasher-right
Electroplating Hood - Au
Electroplating Hood - Cu
Electroplating Hood - Ni
Everbeing EB-6 DC Probe Station
General Material Anneal 1 - A1
Harrick Plasma Generator (2nd Floor)
KOH Hood and Bath
LPCVD CMOS Nitride - E4
LPCVD LTO - B3
LPCVD Nitride - B4
LPCVD TEOS - C3
MOS Clean Anneal 2 - B1
MOS Clean Bench & Tanks
MOS Metal Anneal 3 - C1
MOS Metal Anneal 4 - C2
N+/P+ Polysilicon - C4
Oxford 81 Etcher
Oxford 82 Etcher
Phosphorus Doping - D2
Plasma-Therm Takachi ALE
POCL3 Doping - A2
RTA - AG610a
RTA - AG610b
Wet/Dry Oxide - B2
YES EcoClean Asher

Please acknowledge the CNF in your presentations, posters, and publications.

This material is based upon work supported by the National Science Foundation under Grant No. NNCI-2025233. Any opinions, findings, conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect the views of the National Science Foundation.

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