SubTitle
Oxygen Plasma tool for removal of organics
Training

For training, please contact the Tool Manager(s).

Additional Restrictions
  • For use with standard semiconductor process materials only
Manager
Backups:
Body

The Glen 1000 system utilizes a oxygen plasma source for stripping of photoresist and other organics. The tool can be setup to give direct ion bombardment or in a downstream ion mode for lower surface damage.