SubTitle
Oxygen Plasma tool for removal of organics
Training

Web-based training in CULearn: RSRCH - CNF - Glen 1000P Plasma Cleaning System Training

Additional Restrictions
  • For use with standard semiconductor process materials only
Manager
Body

The Glen 1000 system utilizes a oxygen plasma source for stripping of photoresist and other organics. The tool can be setup to give direct ion bombardment or in a downstream ion mode for lower surface damage.