Oxygen Plasma tool for removal of organics

Web-based training in Workday Learning: RSRCH - CNF - Glen 1000P Plasma Cleaning System Training

Compatibility:
5 - Class A and B Metals and Compounds
Additional Restrictions
  • For use with standard semiconductor process materials only
Manager
Aaron Windsor
Glen 1000

The Glen 1000 system utilizes a oxygen plasma source for stripping of photoresist and other organics. The tool can be setup to give direct ion bombardment or in a downstream ion mode for lower surface damage.

Equipment Information Sheet