SubTitle
Automatic Wafer Processor for SC-1 & Piranha cleans
Training

For training, please contact the Tool Manager(s).

Additional Restrictions
  • Whole wafers or masks sized for available chucks only
  • No thick resist or organic layer stripping - piranha etch to be used for stripping residual material only!
  • Check wafer for materials incompatible with cleaning chemistry to prevent substrate damage
Manager
Backups:
Body

The Hamatech wafer processor is capable of doing a hot piranha (Sulfuric Acid and Hydrogen Peroxide) clean on photomasks (4, 5, 6, & 7 inch) and wafers (3, 4, 6, and 8 inch). It is also capable of performing ammonium hydroxide brush cleans of substrates.

Capabilities
  • Hot piranha clean
  • 3", 4", 6", 8" wafers
  • 4", 5", 6", 7" masks
  • Ammonium hydroxide brush clean