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Garry Bordonaro
Title
Photolithography Engineer
Email - Directory
bordonaro@cnf.cornell.edu
Office Phone
607-254-4936
Manager for:
ABM Contact Aligner
ASML PAS 5500/300C DUV Wafer Stepper
BLE 150 Hotplate
FilMetrics F50
Gamma Automatic Coat-Develop Tool
GCA 6300 DSW 5X g-line Wafer Stepper
GCA AutoStep 200 DSW i-line Wafer Stepper
Heidelberg Mask Writer - DWL2000
Suss Backside Alignment Measurement
SUSS MA6-BA6 Contact Aligner
SUSS MJB4 Contact Aligner
YES Image Reversal Oven
Backup for:
Class 1 Photolithography Hot Plates
Class 1 Photolithography Spinners
Edge Bead Removal System
Hamatech Hot Piranha
Heidelberg MLA 150 Maskless Aligner
Olympus BX-51 Fluorescence Microscope (2nd Floor)
Olympus BX60 Confocal Microscope
Olympus IX-71 Inverted Fluorescence Microscope (2nd Floor)
Olympus MX-50 Microscope
Optical Microscopes - Other
Resist Hot Strip Bath
YES Vapor Prime Oven

Please acknowledge the CNF in your presentations, posters, and publications.

This material is based upon work supported by the National Science Foundation under Grant No. NNCI-2025233. Any opinions, findings, conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect the views of the National Science Foundation.

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