Training
For training, please contact the Tool Manager(s).
Training typically takes up to 1 hour.
Compatibility:
Additional Restrictions
- Pieces, 100mm, and 150mm wafers allowed
- Polymers must be fully cured at least 25C above the deposition temperature
Manager
Backups:
Body
The Arradiance Gemstar-6 ALD system is a benchtop system capable of depositing highly conformal and uniform dielectric and metal thin films. The films are deposited using thermal Atomic Layer Deposition.
Capabilities
The Arradiance Gemstar-6 ALD system is a benchtop system capable of depositing highly conformal and uniform dielectric and metal thin films. The films are deposited with thermal ALD processes.
Processes Available
- Thermal Al2O3
- Thermal TiO2
- Thermal HfO2
- Thermal ZrO2
- Thermal HfZrO2 (piezoelectric HZO)
- Thermal Pt
Applications
ALD films are applicable in many areas including advanced microelectronics (transistors), nanophotonics, MEMS, and catalytic applications to name just a few.