Tool access requirements

General photolithography training, online and in-person, is required to use this tool.

General photolithography training

For the online part of general photolithography training, use Workday Learning:

  • RSRCH - CNF - General Photolithography Overview Video Training

Additionally, find required and recommended reading here:

For in-person general photolithography training, contact:

Sherri Ellis

Giovanni Sartorello

Garry Bordonaro

Compatibility:
5 - Class A and B Metals and Compounds
Additional Restrictions
  • Class 2 materials only (SU-8, LOR, PGMI, LOL, KMPR, OmniCoat, Polyimide).
  • NO WATER and NO SOLVENTS (acetone, isopropanol, methanol, etc.). Acetone on a wipe may be used to clean chucks and around the spinner.
  • No biomaterials.
Manager
Giovanni Sartorello
Backups:
James Crawford
Tom Pennell

Spinners for coating substrates with Class 2 materials.

Equipment Information Sheet