FilMetrics F50-EXR Optical Measurement System for transparent thin film measurement


Training for the FilMetrics systems is done with a training video available in CULearn as course RSRCH - CNF - FilMetrics Film Measurement. Once you have watched the entire video you are authorized to use the FilMetrics tools.

The new F50-EXR is different from the F50/F20 shown in the video. You do not move the fiber optic on the new system as refractive index can now be measured on the automatic stage. Otherwise, the basic principles of use are the same. Refer to the F50-EXR documentation at the tool for information specific to this newer model.

Additional Restrictions
  • None

The F50-EXR system can be used for measurements of thickness, refractive index(n), and dispersion(k), as well as wafer mapping of any of these properties from 30 nm up to 250 micron.

A film model must be available that gives the n & k of the film over the optical wavelength range of the tool (380 nm - 1700 nm for the F50-EXR). For new films, the Woollam Spectroscopic Ellipsometer can give a thorough analysis and generate the required data so that the faster FilMetrics can be used for thickness mapping and other measurements.