Training

Tool access requirements

General photolithography training, online and in-person, is required to use this tool.

General photolithography training

For the online part of general photolithography training, use Workday Learning:

  • RSRCH - CNF - General Photolithography Overview Video Training

Additionally, find required and recommended reading here:

For in-person general photolithography training, contact:

Sherri Ellis

Giovanni Sartorello

Garry Bordonaro

Additional Restrictions
  • Class 1 materials only (most positive resist, nLOF, i-line and DUV materials, P-20 primer).
  • The backside of all substrates must be inspected and cleaned prior to baking.
  • No low temperature materials.
Body

Hot plates for baking substrates with Class 1 materials.

Processes Available
  • EMS vacuum hot plates are used for typical processing, while proximity hot plates are available for DUV and critical processes.
  • Typical temperatures range from 90°C to 205°C.
  • Proximity gaps are programmable, but are typically 160 μm.