Hot plates for baking photoresist

Tool access requirements

General photolithography training, online and in-person, is required to use this tool.

General photolithography training

For the online part of general photolithography training, use CU Learn:

RSRCH - CNF - General Photolithography Overview Video Training (NetID)

RSRCH - CNF - General Photolithography Overview Video Training (GuestID)

Additionally, find required and recommended reading here:

CNF Users: Photolithography

For in-person general photolithography training, contact:

Giovanni Sartorello

Garry Bordonaro

Compatibility:
5 - Class A and B Metals and Compounds
Additional Restrictions
  • No low temperature materials
  • No resist on back of substrate
Manager
Garry Bordonaro
Backups:
Giovanni Sartorello
Photolithography Hot Plates

Several hot plates are available for photoresist baking.  EMS vacuum hotplates are used for typical processing, while CEE 1300X Proximity hotplates are available for DUV and critical processes.  Typical temperatures range from 90C to 205C.  Proximity gaps are programmable but are typically 160um.

Equipment Information Sheet