Training
Tool access requirements
General photolithography training, online and in-person, is required to use this tool.
General photolithography training
For the online part of general photolithography training, use Workday Learning:
- RSRCH - CNF - General Photolithography Overview Video Training
Additionally, find required and recommended reading here:
For in-person general photolithography training, contact:
Compatibility:
Additional Restrictions
- Class 1 materials only (most positive resist, nLOF, i-line and DUV materials, P-20 primer).
- The backside of all substrates must be inspected and cleaned prior to baking.
- No low temperature materials.
Manager
Backups:
Body
Hot plates for baking substrates with Class 1 materials.
Processes Available
- EMS vacuum hot plates are used for typical processing, while proximity hot plates are available for DUV and critical processes.
- Typical temperatures range from 90°C to 205°C.
- Proximity gaps are programmable, but are typically 160 μm.