Hot plates for baking photoresist

Web-based Training. Sign up for: RSRCH - CNF - General Photolithography Training Video

Additional Restrictions
  • No low temperature materials
  • No resist on back of substrate

Several hot plates are available for photoresist baking.  EMS vacuum hotplates are used for typical processing, while CEE 1300X Proximity hotplates are available for DUV and critical processes.  Typical temperatures range from 90C to 205C.  Proximity gaps are programmable but are typically 160um.