SubTitle
Hot plates for baking photoresist
Training
Tool access requirements
General photolithography training, online and in-person, is required to use this tool.
General photolithography training
For the online part of general photolithography training, use Workday Learning:
RSRCH - CNF - General Photolithography Overview Video Training
Additionally, find required and recommended reading here:
For in-person general photolithography training, contact:
Compatibility:
Additional Restrictions
- No low temperature materials
- No resist on back of substrate
Manager
Backups:
Body
Several hot plates are available for photoresist baking. EMS vacuum hotplates are used for typical processing, while CEE 1300X Proximity hotplates are available for DUV and critical processes. Typical temperatures range from 90C to 205C. Proximity gaps are programmable but are typically 160um.