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Hot plates for baking photoresist
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Additional Restrictions
  • No low temperature materials
  • No resist on back of substrate
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Several hot plates are available for photoresist baking.  EMS vacuum hotplates are used for typical processing, while CEE 1300X Proximity hotplates are available for DUV and critical processes.  Typical temperatures range from 90C to 205C.  Proximity gaps are programmable but are typically 160um.