SubTitle
Heated solvent for photoresist stripping
Training

Web-based Training. Sign up for: RSRCH - CNF - General Photolithography Training Video

Additional Restrictions
  • Resist coated substrates only - NO lift-off processing
  • NO SU-8, Polyimide, LOR, Class 2 Materials
  • Holder must retain substrate - no loose material
Body

The photolithography area has a two tank hot solvent bath for stripping photoresist. A dump rinser and double-stack spin rinse dryer make for easy stripping of wafers or photomasks.

Capabilities

Hot NMP