Heated solvent for photoresist stripping

Tool access requirements

General photolithography training, online and in-person, is required to use this tool.

General photolithography training

For the online part of general photolithography training, use Workday Learning:

  • RSRCH - CNF - General Photolithography Overview Video Training

Additionally, find required and recommended reading here:

For in-person general photolithography training, contact:

Giovanni Sartorello

Garry Bordonaro

Compatibility:
5 - Class A and B Metals and Compounds
Additional Restrictions
  • Resist coated substrates only - NO lift-off processing
  • NO SU-8, Polyimide, LOR, Class 2 Materials
  • Holder must retain substrate - no loose material
Manager
Giovanni Sartorello
Backups:
Garry Bordonaro
Michael Skvarla
Resist Hot Strip Bath

The photolithography area has a two tank hot solvent bath for stripping photoresist. A dump rinser and double-stack spin rinse dryer make for easy stripping of wafers or photomasks.

Capabilities

Hot NMP

Equipment Information Sheet