Heated solvent for photoresist stripping
- Resist coated substrates only - NO lift-off processing
- NO SU-8, Polyimide, LOR, Class 2 Materials
- Holder must retain substrate - no loose material
The photolithography area has a two tank hot solvent bath for stripping photoresist. A dump rinser and double-stack spin rinse dryer make for easy stripping of wafers or photomasks.