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Plasma-Therm Takachi ALE

Equipment Menu

  • Photolithography
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SubTitle
Atomic Layer Etching
Training

For training, please contact the Tool Manager(s).

Compatibility:
2 - Silicon Based Substrates and Select Refractory Metals
Additional Restrictions

Select III/V materials allowed- ask staff before proceeding!

Manager
Jeremy Clark
Backups:
Aaron Windsor
Picture of Plasma-Therm Takachi ALE
Body

Atomic Layer Etching system configured with an ICP and loadlock

Equipment Information Sheet

Please acknowledge the CNF in your presentations, posters, and publications.

This material is based upon work supported by the National Science Foundation under Grant No. NNCI-2025233. Any opinions, findings, conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect the views of the National Science Foundation.

Information on web accessibility.

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