SubTitle
Manual Resist Spinners for coating substrates with electron beam resist.
Training
TRAINING
For training, please contact the Tool Manager(s) at ebeam@cnf.cornell.edu
Please review electron beam lithography training materials, in AFS, at: shares - public - processes_from_cnf_staff - ElectronBeamLithography - TrainingMaterials (accessible on any general use PC or CNF Thin station at CNF)
Compatibility:
Additional Restrictions
- Use only approved ebeam lithography resists and solvents
Manager
Backups:
Body
Three manual spinners are provided for spin coating substrates with electron beam resists. Substrates up to 300 mm diameter can be coated.
Capabilities
- Wafers up to 300mm
- Pieces greater than 5mm
Applications
Please review electron beam lithography training materials, in AFS, at: shares - public - processes_from_cnf_staff - ElectronBeamLithography - TrainingMaterials (accessible on any general use PC or CNF Thin station at CNF)
