SubTitle
Manual Resist Spinners for coating substrates with electron beam resist.
Training

TRAINING

For training, please contact the Tool Manager(s) at ebeam@cnf.cornell.edu

Please review electron beam lithography training materials, in AFS, at: shares - public - processes_from_cnf_staff - ElectronBeamLithography - TrainingMaterials (accessible on any general use PC or CNF Thin station at CNF)

Additional Restrictions
  • Use only approved ebeam lithography resists and solvents
Body

Three manual spinners are provided for spin coating substrates with electron beam resists. Substrates up to 300 mm diameter can be coated.

Capabilities
  • Wafers up to 300mm
  • Pieces greater than 5mm
Applications

Please review electron beam lithography training materials, in AFS, at: shares - public - processes_from_cnf_staff - ElectronBeamLithography - TrainingMaterials (accessible on any general use PC or CNF Thin station at CNF)