Solid Source Boron Diffusion
Tool Location
103

Training for the furnace area covers the pre-furnace MOS clean, atmospheric and LPCVD processes. It is scheduled on a need basis, please email the tool manager for training requests. Include MOS area training in the subject header. You will be notified when the next scheduled training will be by email.

Compatibility:
1E - Silicon Based Materials and Select Dieletrics
Additional Restrictions
  • MOS CLEAN required prior to use
Manager
Phil Infante
Backups:
Aaron Windsor
Furnace Bank D
Capabilities

The Boron Doping Furnace is an atmospheric furnace with a 40” flat zone capable of processing up to 6” diameter wafers. The furnace tube is configured for utilizing solid source wafers for silicon doping. The furnace is restricted to silicon materials. Current solid planer diffusion sources are limited to 100mm.

Equipment Information Sheet