SubTitle
Anatech Plasma Asher
Training

For training, please contact the Tool Manager(s).

Additional Restrictions
  • Silicon wafers, III-V wafers, glass, and ceramic only
  • No plastic or metal
  • No Cadmium, no Zinc
Manager
Body

The Anatech USA, model SCE-110-RF, Oxygen plasma Asher is a 10 inch diameter all quartz barrel asher. It is ICP powered 13.56 MHz up to 1000 Watts. It is equipped for both oxygen and nitrogen plasma.

Capabilities

The touch screen controller is configured to run up to 3 step processes, and the first step can be programmed to terminate at a temperature set point on a chamber probe.

Applications

Typically wafer descum after developing resist, and stripping resist after an etch.