Tool Location
103
Training
For training, please contact the Tool Manager(s).
Compatibility:
Additional Restrictions
- MOS CLEAN required prior to use
- Only use desginated MOS holders, wands and tweezers
Manager
Backups:
Body
LPCVD furnace configured with Silane and Diluted Diborane to deposit undoped or in-situ doped polysilicon on 100 or 150mm substrates.