SubTitle
JEOL JBX9500FS Electron Beam Lithography System
Training

Training covers operation of the JEOL 9500, after a user has done the general electron beam lithography training. JEOL 6300 training is separate. Please sign up online at least one day in advance on the CNF users face to face training page . Training will take place only if someone has signed up online at least one day in advance.

Please review electron beam lithography training materials, in AFS, at shares - public - processes_from_cnf_staff - ElectronBeamLithography - TrainingMaterials (accessible on any general use PC or CNF Thin client at CNF)

Additional Restrictions
  • Fully baked resists only; do not load samples with unbaked resist or glue or anything that may degas.
  • Please review electron beam lithography training materials, in AFS, at shares - public - processes_from_cnf_staff - ElectronBeamLithography - TrainingMaterials¬†(accessible on any general use PC or CNF Thin client at CNF)

Body

The JEOL 9500 is the next generation direct write ebeam lithography system from JEOL. Currently it is the only system in the US and only the 3rd in the world. The CNF tool is the first 9500 with improved column optics for a reduced spot size, making it unique among the systems currently in operation.

The tool is capable of loading samples from 10 mm up to 300 mm and writing features as small as 6 nm or less. The clock speed has been increased to 100 MHz, reducing write times. Stitching and overlay specifications have also been in improved dramatically over the previous generation.

Capabilities
  • Accelerating Voltage: 100 kV
  • Field Size: 1 mm
  • Writing Speed: 100 MHz
  • Sample Size: Small pieces to 300 mm wafers
  • Minumum beam diameter: 3.2 nm
  • Minimum Feature Size: 6 nm
  • Maximum beam current: 100 nA