Training covers operation of the JEOL 9500, after a user has done the general electron beam lithography training. JEOL 6300 training is separate. Please request training by sending an email to ebeam@cnf.cornell.edu
IF YOUR E BEAM EXPOSURE WILL BE ALIGNED WITH A PATTERN ALREADY ON THE WAFER, PLEASE READ AND FOLLOW THE DIRECTIONS AT https://www.cnfusers.cornell.edu/ebeam_alignment BEFORE DESIGNING ANY DEVICE PATTERNS IN CAD. NOT FOLLOWING THESE DIRECTIONS MAY MAKE ALIGNMENT IMPOSSIBLE.
- Fully baked resists only; do not load samples with unbaked resist or glue or anything that may degas.
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Please review electron beam lithography training materials, in AFS, at shares - public - processes_from_cnf_staff - ElectronBeamLithography - TrainingMaterials (accessible on any general use PC or CNF Thin client at CNF)
The JEOL 9500 is a modern direct write ebeam lithography system from JEOL. The CNF tool was the first 9500 with improved column optics for a reduced spot size.
The tool is capable of loading samples from 10 mm up to 300 mm and writing features as small as 6 nm or less. The clock speed has been increased to 100 MHz, reducing write times. Stitching and overlay specifications have also been in improved dramatically over the previous generation.
- Accelerating Voltage: 100 kV
- Field Size: 1 mm
- Writing Speed: 100 MHz
- Sample Size: Small pieces to 300 mm wafers
- Minumum beam diameter: 3.2 nm
- Minimum Feature Size: 6 nm
- Maximum beam current: 100 nA