Training covers operation of the JEOL 9500, after a user has done the general electron beam lithography training. JEOL 6300 training is separate. Please request training by sending an email to firstname.lastname@example.org
IF YOUR E BEAM EXPOSURE WILL BE ALIGNED WITH A PATTERN ALREADY ON THE WAFER, PLEASE READ AND FOLLOW THE DIRECTIONS AT https://www.cnfusers.cornell.edu/ebeam_alignment BEFORE DESIGNING ANY DEVICE PATTERNS IN CAD. NOT FOLLOWING THESE DIRECTIONS MAY MAKE ALIGNMENT IMPOSSIBLE.
- Fully baked resists only; do not load samples with unbaked resist or glue or anything that may degas.
Please review electron beam lithography training materials, in AFS, at shares - public - processes_from_cnf_staff - ElectronBeamLithography - TrainingMaterials (accessible on any general use PC or CNF Thin client at CNF)
The JEOL 9500 is the next generation direct write ebeam lithography system from JEOL. Currently it is the only system in the US and only the 3rd in the world. The CNF tool is the first 9500 with improved column optics for a reduced spot size, making it unique among the systems currently in operation.
The tool is capable of loading samples from 10 mm up to 300 mm and writing features as small as 6 nm or less. The clock speed has been increased to 100 MHz, reducing write times. Stitching and overlay specifications have also been in improved dramatically over the previous generation.
- Accelerating Voltage: 100 kV
- Field Size: 1 mm
- Writing Speed: 100 MHz
- Sample Size: Small pieces to 300 mm wafers
- Minumum beam diameter: 3.2 nm
- Minimum Feature Size: 6 nm
- Maximum beam current: 100 nA