General photolithography training is required to use the e-beam spinners, hot plates and tools.
In-person training by staff is required to use the JEOL 9500. Please request training by contacting the tool manager(s) or sending an email to ebeam@cnf.cornell.edu.
If you're going to need alignment, read the requirements at https://www.cnfusers.cornell.edu/ebeam_alignment BEFORE DESIGNING ANY DEVICE. Not following these instructions may make alignment impossible.
- Fully baked resists only; do not load samples with unbaked resist or glue or anything that may degas.
The JEOL JBX-9500FS Electron Beam Lithography System is a modern direct write e-beam lithography system. The CNF tool was the first 9500 with improved column optics for a reduced spot size.
The tool is capable of loading samples from 10 mm up to 300 mm and writing features as small as 6 nm or less. The clock speed has been increased to 100 MHz, reducing write times. Stitching and overlay specifications have also been in improved dramatically over the previous generation.
- Accelerating Voltage: 100 kV
- Field Size: 1 mm
- Writing Speed: 100 MHz
- Sample Size: Small pieces to 300 mm wafers
- Minumum beam diameter: 3.2 nm
- Minimum Feature Size: 6 nm
- Maximum beam current: 100 nA